| Prof. Don’s Monograph of the Genus Disporum. 521 
8. D. pullum, umbellis sessilibus sub-4-floris, sepalis lanceolatis acutis basi 
brevitér calcaratis, antheris filamentis vix -brevioribus, stigmatibus styli 
longitudine, foliis lanceolatis subpetiolatis. 
Disporum pullum. Salisb. in Hort. Trans. i. p. 331. Schult. fil. Syst. vii. 
p. 371. 
Uvularia chinensis. Ker in Bot. Mag. t. 916. 
Streptopus chinensis. Sm. in Rees Cyclop. sub Uvularid. 
Hab. in China, 4. (v. v. c. et s. in Herb. Smith). 
- Caulis erectus, ramosus, angulatus, cubitalis, ramis triquetris. Folia lanceolata, 
longè acuminata, ima basi constrictà subpetiolata, subtüs ad nervos oram- 
que scabriuscula, 3-pollicaria, semunciam et ultra lata. Umbella sessilis, 
plerumque 3- v. 4-flora, rariùs 2- v. 5-flora. Pedicelli semunciales, 
6-angulati angulis scabriusculis. Flores intense fulvi. Sepala lanceo- 
lata, acuta, subconduplicata, carinata, semuncialia, margine scabriuscula. 
Calcaria recta, obtusa, sepalis 4-pló breviora. Filamenta infernè dilatata, 
complanata. Anthere obtuse, ferè longitudine filamentorum. Ovarium 
3-gonum, turbinatum. Stigmata recurvata, dorso carinata, superficie 
minuté papillosa, styli triquetri longitudine. 
This is the species upon which the genus was originally proposed to be 
founded. It has been cultivated in our collections for a considerable period, 
having been first introduced in 1801 into the Royal Botanic Garden at Kew 
from China, but its actual native locality is still unknown. Its proper place 
in the genus is evidently near parvifforum, with which it accords in habit, and 
in several other respects. The umbels are sessile, and few-flowered ; the 
sepals calcarate at the base; and the anthers are about equal in length to the 
filaments, as the style is to the stigmas. The trivial name of this species is 
inadvertently printed “fulvum” in the Prodromus Flore Nepalensis, and in 
the Society's Proceedings. 
Having thus completed my account of Disporum, I shall now add a descrip- 
tion of the genus already noticed in my introductory remarks. 
