184 



^120 

 cr> 



^110 

 o 



dDlOO 

 Ti 



D 90 







_1 



d^ 80 

 o 

 Z 70 



1 60 



t ID 



^ 50 



t/5 



^ 4-0 

 D 30 



X 



V, 20 



CR 400 500 600 700 800 VOO 1000 1100 1200 1300 

 Annealing Temp, in Deg.F;( IHrai Temp.) 



CaiBT 22. — The effect of annealing on the Rockwell hardness and 

 percentage elongation in 2 in. of silicon-brass No. 2 strip, previously 

 cold-rolled 6 B. & S. Nos. (50 per cent reduction of area) from two 

 different grain sizes, 0.015 and 0.080 mm. (72.36% copper, 0.47% 

 silicon, balance zinc) (0.040-in. stock). 



Copper and Copper-base Alloys 



i 



400 500 600 700 800 900 1000 1100 1200 1300 

 Annealing Temp, in Deg.Ffl Hr.at Temp.) 



Ch.^rt 23. — The effect of annealing on the yield strength of silicon- 

 brass No. 2 strip, previously cold-rolled 6 B. & S. Nos. (50 per cent 

 reduction of area) from a grain size of 0.015 mm. (72.36 % copper, 

 0.47 % silicon, balance zinc) (0.040-in. stock). 



100 



90 



70 



i 60 



50 



_1 



o 30 

 o 

 o 

 - 20 



10 







400 500 600 700 600 900 1000 1100 1200 1300 

 Annealing Temp, in Deg.F. ( IHr. a+ Temp.) 

 Chart 24. — The effect of annealing on the yield strength of silicon-brass No. 2 strip, previously cold-rolled 6 B. & S. Nos. (50 per cent reduction 

 of area) from a grain size of 0.080 mm. (72.36 % copper, 0.47 % silicon, balance zinc) (0.040-in. stock). 



