242 



Copper and Copper-base Alloys 



900 1000 1100 1200 1300 1400 



Annealing Temp, in Deq.F (1 Hn a+ Temp.) 



Ch.^kt 5. — The effect of annealing on the grain-growing charac- 

 teristics of Type A silicon-bronze strip, previously cold-rolled 10 B. & 

 S. Nos. (67 per cent reduction of area) from a grain size of 0.070 mm. 

 (96.50 % copper, 3.00 % silicon, 0.50 % tin) (0.040-in. stock). 



100 



90 



80 - 



70 



60 



50 



CR 500 600 700 800 900 1000 1100 1200 1300 1400 

 Annealing Temp, in Deg.F. (1 Hr. a+ Temp.) 

 Ch.\rt 6. — The eSect of annealing on the tensile strength of Type A 

 silicon-bronze strip, previously cold-rolled from 2 to 29 per cent (reduc- 

 tion of area) from a ready-to-finish grain size of 0.090 mm. (96.50 % 

 copper, 3.00 % silicon, 0.50 % tin) (0.040-in. stock). 



90 



70 



o 60 



50 



40 



< 30 



20 



120 



CR 500 600 700 800 900 1000 1100 1200 1300 1400 



Annealing Temp, in Deg.E f IHr. a+Temp.) 



Chart 7. — The effect of annealing on the apparent elastic limit of 



Type A silicon-bronze strip, previously cold-rolled from 2 to 29 per 



cent (reduction of area) from a ready-to-finish grain size of 0.090 mm. 



(96.50 % copper, 3.00 % silicon, 0.50 % tin) (0.040-in. stock). 



100 



90 



80 



CR 500 600 700 800 900 1000 1100 1200 1300 1400 

 Annealing Temp. in Deg.F f lHna+ Temp.') 

 Ch.\rt S. — The effect of annealing on the Rockwell hardness of 

 Type A silicon-bronze strip, previously cold-rolled from 2 to 29 per cent 

 (reduction of area) from a ready-to-finish grain size of 0.090 mm. 

 (96.50 % copper, 3.00 % silicon, 0.50 % tin) (0.040-in. stock). 



