RESISTANCE AS A 
55 FUNCTION OF PRESSURE 
KQ VS PSIG 
b 
a 
° 
fe 
RESISTANCE (Ka) 
g 
£ 
{e) 
RESISTORS 
1/2 WATT SIK2 5% COMPOSITION CARBON 
| WATT S5IK2 5% COMPOSITION CARBON 
2 WATT SIKQ2 5% COMPOSITION CARBON 
2 WATT 5SIKQ 1% TIN OXIDE 
2 WATT S5IK2 5% CARBON FILM 
35 
obXxX oO 
ste 1000 2000 3000 4000 5000 6000 7000 8000 9000 10,000 
PRESSURE (PSIG) 
Figure 3 
PERCENT CHANGE IN RESISTANCE 
AT 10,000 PSIG VS RESISTANCE 
FOR CARBON COMPOSITION RESISTORS 
CHANGE IN RESISTANCE AT 10,000 PSIG (%) 
ie) 
Ol IK 10K lOOK IM 10M 
RESISTANCE (OHMS) 
Figure 4 
127 
