DECREASE IN RESISTANCE (PERCENT) 
30 
(1) lOOKQ,1W, IN DENSE EPOXY (UNPROTECTED) 
(2) 100K Q 1W, IN DENSE EPOXY (COVERED WITH SILICON RUBBER) 
(3)100K 2 1W, IN LIGHT EPOXY (COVERED WITH SILICON RUBBER) 
25 
20 
4000 5000 6000 7000 8000 9000 10000 
PRESSURE (PSIG) 
O 1000 =2000 3000 
Figure 16 
Figure 17 
Figure 18 
134 
